Engineering of microfabricated ion traps and integration of advanced on-chip features

Romaszko, Zak David, Hong, Seokjun, Siegele, Martin, Puddy, Reuben Kahan, Lebrun-Gallagher, Foni Raphaël, Weidt, Sebastian and Hensinger, Winfried Karl (2020) Engineering of microfabricated ion traps and integration of advanced on-chip features. Nature Reviews Physics, 2. pp. 285-299. ISSN 2522-5820

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Abstract

Atomic ions trapped in electromagnetic potentials have long been used for fundamental studies in quantum physics. Over the past two decades, trapped ions have been successfully used to implement technologies such as quantum computing, quantum simulation, atomic clocks, mass spectrometers and quantum sensors. Advanced fabrication techniques, taken from other established or emerging disciplines, are used to create new, reliable ion-trap devices aimed at large-scale integration and compatibility with commercial fabrication. This Technical Review covers the fundamentals of ion trapping before discussing the design of ion traps for the aforementioned applications. We overview the current microfabrication techniques and the various considerations behind the choice of materials and processes. Finally, we discuss current efforts to include advanced, on-chip features in next-generation ion traps.

Item Type: Article
Schools and Departments: School of Mathematical and Physical Sciences > Physics and Astronomy
SWORD Depositor: Mx Elements Account
Depositing User: Mx Elements Account
Date Deposited: 08 Jul 2020 07:59
Last Modified: 28 Nov 2020 02:00
URI: http://sro.sussex.ac.uk/id/eprint/92397

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