Micro-fabrication employing UV microstereolithography

Chatwin, Chris, Young, Rupert, Budgett, David and Birch, Philip (2001) Micro-fabrication employing UV microstereolithography. In: Materials Opportunities on Layered Manufacturing Technology 2 – (MOLMT-2), June 3rd – 6th, 2001, UMIST, Weston Conference Centre, UMIST, Manchester, UK.

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Abstract

A new stereophotolithography technique utilizing a spatial light modulator ~SLM! to create threedimensional components with a planar, layer-by-layer process of exposure is described. With this procedure it is possible to build components with dimensions in the range of 50 mm–50 mm and feature sizes as small as 5 mm with a resolution of 1 mm. A polysilicon thin-film twisted nematic SVGA SLM is used as the dynamic photolithographic mask. The system consists of eight elements: a UV laser light source, an optical shutter, beam-conditioning optics, a SLM, a multielement reduction lens system, a high-resolution translation stage, a control system, and a computer-aided-design system. Each of these system components is briefly described. In addition, the optical characteristics of commercially available UV curable resins are investigated with nondegenerate four-wave mixing. Holographic gratings were written at a wavelength of 351.1 nm and read at 632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins.

Item Type: Conference or Workshop Item (Paper)
Keywords: MEMS, microsterolithography, UV, spatial light modulators, photo-polymers, lasers, control systems
Schools and Departments: School of Engineering and Informatics > Engineering and Design
Subjects: Q Science > QA Mathematics > QA0076 Computer software
Q Science > QC Physics > QC0350 Optics. Light
Q Science > QD Chemistry
T Technology
T Technology > TJ Mechanical engineering and machinery > TJ0212 Control engineering systems. Automatic machinery (General)
Related URLs:
Depositing User: Chris Chatwin
Date Deposited: 29 Jun 2015 08:43
Last Modified: 29 Jun 2015 08:43
URI: http://sro.sussex.ac.uk/id/eprint/55004

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