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Flexible quasi-vertical In-Ga-Zn-O thin-film transistor with 300-nm channel length
journal contribution
posted on 2023-06-08, 20:43 authored by L Petti, A Frutiger, Niko Munzenrieder, G A Salvatore, L Buthe, C Vogt, G Cantarella, G TrosterIn this letter, we report a flexible Indium–Gallium–Zinc-Oxide quasi-vertical thin-film transistor (QVTFT) with 300-nm channel length, fabricated on a free-standing polyimide foil, using a low-temperature process <150 °C. A bilayer lift-off process is used to structure a spacing layer with a tilted sidewall and the drain contact on top of the source electrode. The resulting quasi-vertical profile ensures a good coverage of the successive device layers. The fabricated flexible QVTFT exhibits an ON/OFF current ratio of 10^{4} , a threshold voltage of 1.5 V, a maximum transconductance of 0.73 \mu text{S}~\mu {\rm m}^{-1} , and a total gate capacitance of 76 nF \mu {\rm m}^{-1} . From S-parameter measurements, we extracted a transit frequency of 1.5 MHz. Furthermore, the flexible QVTFT is fully operational when bent to a tensile radius of 5 mm.
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Publication status
- Published
File Version
- Published version
Journal
IEEE Electron Device LettersISSN
0741-3106Publisher
IEEEExternal DOI
Issue
5Volume
36Page range
475-477Department affiliated with
- Engineering and Design Publications
Full text available
- No
Peer reviewed?
- Yes
Legacy Posted Date
2015-05-08First Compliant Deposit (FCD) Date
2015-05-08Usage metrics
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