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UV microstereolithography system that uses spatial light modulator technology
journal contribution
posted on 2023-06-08, 18:49 authored by Chris ChatwinChris Chatwin, Maria Farsari, Shiping Huang, Malcolm Heywood, Phil BirchPhil Birch, Rupert YoungRupert Young, John RichardsonA new stereophotolithography technique utilizing a spatial light modulator ~SLM! to create threedimensional components with a planar, layer-by-layer process of exposure is described. With this procedure it is possible to build components with dimensions in the range of 50 mm–50 mm and feature sizes as small as 5 mm with a resolution of 1 mm. A polysilicon thin-film twisted nematic SVGA SLM is used as the dynamic photolithographic mask. The system consists of eight elements: a UV laser light source, an optical shutter, beam-conditioning optics, a SLM, a multielement reduction lens system, a high-resolution translation stage, a control system, and a computer-aided-design system. Each of these system components is briefly described. In addition, the optical characteristics of commercially available UV curable resins are investigated with nondegenerate four-wave mixing. Holographic gratings were written at a wavelength of 351.1 nm and read at 632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins. These experiments were carried out to prove the suitability of these photopolymerization systems for microstereolithography.
History
Publication status
- Published
File Version
- Published version
Journal
Applied OpticsISSN
0003-6935Publisher
Optical Society of AmericaExternal DOI
Issue
32Volume
37Page range
7514-7522Department affiliated with
- Engineering and Design Publications
Full text available
- No
Peer reviewed?
- Yes
Legacy Posted Date
2015-06-19First Compliant Deposit (FCD) Date
2014-10-29Usage metrics
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