Nano-cluster engineering: A combined ion implantation/co-deposition and ionizing radiation

Ila, D, Zimmerman, R L, Muntele, C I, Thevenard, P, Orucevic, F, Santamaria, C L, Guichard, P S, Schiestel, S, Carosella, C A, Hubler, G K, Poker, D B and Hensley, D K (2002) Nano-cluster engineering: A combined ion implantation/co-deposition and ionizing radiation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 191 (1-4). pp. 416-421. ISSN 0168-583X

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Abstract

We have used the energy deposited due to the electronic excitation by post-implantation irradiation to induce the nucleation of nano-clusters of Au in silica. We have produced the Au/silica by two methods. (A) MeV An implantation into silica, (B) producing thin films of a combined Art and silica on a silica substrate, using co-deposition of gold and silica. The process of ion beam assisted nucleation of nano-clusters was used to reduce the threshold implantation dose, or the An concentration in the silica host, required to produce An nano-crystals by at least two orders of magnitude. In this presentation, we applied a similar technique, post-irradiation electronic excitation, to films produced by both ion implantation of Au into silica as well as to films produced using co-deposition of gold and silica. By a co-deposition technique, gold and silica (co-deposited at various concentrations) are grown, then post-irradiated. The resultant An nano-cluster formation was observed and Studied using optical spectroscopy, X-ray diffraction. RBS and TEM.

Item Type: Article
Schools and Departments: School of Mathematical and Physical Sciences > Physics and Astronomy
Depositing User: Fedja Orucevic
Date Deposited: 06 Feb 2012 19:04
Last Modified: 30 Nov 2012 17:02
URI: http://sro.sussex.ac.uk/id/eprint/19236
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